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DKL Engineering, Inc.
		
Handbook of Sulphuric Acid Manufacturing
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Preface
Contents
Technology - SUPRACID®
March 1, 2003
| Introduction | Associated Links | 
The SUPRACID®
process is a combination of the SULFACID® 
process and an upstream acid concentrator.  
The combined process can be used when the incoming gas is above 100°C and the 
water content is well below its saturation point.
The basic 
principle is to contact the gas with a stream of acid causing water to evaporate 
from acid thereby concentrating the acid in the process.  
This concentration is achieved in a one or two stage concentrator comprising 
acid sprays and multi-venturi nozzle trays.
Hot gas 
entering the bottom of the concentrator is contacted by a circulating stream of 
60 to 70% sulphuric acid (acid concentrations will vary with the application).   
Weaker acid (20 to 30% H2SO4) from the second stage 
concentrator is fed to the first stage.  
The hot gas is cooled by evaporation of water into the gas while the weaker acid 
is effectively concentrated from 20-30% to 60-70%.  
The gas then passes into the second stage of the concentrator which is located 
directly above the first stage.
In the second 
stage, the gas is cooled further, again by evaporation of the water into the gas 
stream.  Acid at a concentration of 
20 to 30% sulphuric acid is circulated to cool the gas further by evaporation of 
water from the acid.  In the second 
stage, weaker acid (approximately 14% H2SO4) from the 
downstream SULFACID® reactor is mixed with the 
circulating acid.  The overall 
effect is top cool the gas and concentrate acid from 14% to 20-30% sulphuric 
acid.
The cooled gas 
leaves the concentrator and enters the SULFACID® 
reactor where the sulphur dioxide is converted to sulphuric acid by wet 
catalysis in the presence of oxygen, water and carbon-bearing catalyst located 
in the fixed bed reactor.
Product acid is 
drawn from the first stage of the concentrator on level control.   
The acid is cooled and filtered (if required) before delivery to storage.